InternationalConference_134 Posted 2020年3月30日 by master Hiroki Yamazawa, Sheyang Ning, Tomoko Ogura Iwasaki, Shuhei Tanakamaru, Koh Johguchi and Ken Takeuchi, “50 nm AlxOy ReRAM Array Retention Characteristics Before and After Endurance,” Silicon Nanoelectronics Workshop (SNW) Poster, June 2014.
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