InternationalConference_009

Shinji Satoh, Hiroyuki Hagiwara, Toru Tanzawa, Ken Takeuchi, and Riichiro Shirota, “A Novel Isolation-Scaling Technology for NAND EEPROMs with the Minimized Program Disturbance,” IEEE International Electron Devices Meeting (IEDM), pp. 291-294, December 1997.

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